Atomic Level Technical Services
Over the past 15 years, our team have been focusing on the development of Gas Cluster Ion Beam Technology (GCIB), an innovative solution to next-generation semiconductor manufacturing. Compared to tranditional equipment, GCIB holds uncomparable advantages in surface planarization, shallow implanatation, and selective etching. In 2025, the world's highest-flux GCIB system would be in operation, creating unfathomable capabilities for the exploration for future technology innvations.